Mechanically Exfoliated Monolayer MoS2 on Substrates
Each piece is unique.
Product Detail
CAS No.: 1317-33-5 (MoS2); 60676-86-0 (SiO2)
NOTE: Each piece is unique and the technical information below and TDS are for reference only.
1. Preparation Method
Mechanical Exfoliation Method
2. Characterizations
|
Substrate: |
SiO2 Substrate |
|
Substrate size: |
10 mm x 10 mm |
|
Monolayer MoS2 Area: |
＞10 µm2 |
Typical Image of ACS Material Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate
Typical AFM Image of ACS Material Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate
3. Application Fields
An excellent device materials for studying the number of layers and fluorescence effects.
Disclaimer: ACS Material LLC believes that the information on our website is accurate and represents the best and most current information available to us. ACS Material makes no representations or warranties either express or implied, regarding the suitability of the material for any purpose or the accuracy of the information listed here. Accordingly, ACS Material will not be responsible for damages resulting from use of or reliance upon this information.
FAQ
1. What is the thickness of the SiO2 layer of Mechanically Exfoliated Monolayer MoS2 on SiO2 Substrates? Is this a natively oxidized layer or a thermally oxidized layer?
The thickness of SiO2 layer is about 300nm, and it’s a thermally oxidized layer.