CVD Method Monolayer MoS2
Product Detail
CAS-No.: 1317-33-5 (MoS2); 60676-86-0 (SiO2);
High-quality monolayer molybdenum disulfide (MoS2) prepared by chemical vapor deposition (CVD) from ACS Material is available on various substrates (SiO2 and sapphire). CVD molybdenum disulfide (MoS2) monolayer functions as a direct bandgap semiconductor and can be built into a range of electronic and optoelectronic devices such as photovoltaic solar cells, sensors, photodetectors, and FETs. In addition, CVD monolayer MoS2 can be used for research in microscopic analysis, photoluminescence research, and Raman spectroscopy studies.
CVD monolayer MoS2 is just one of the many high-grade, cutting-edge nanomaterials available at ACS Material. Our research materials are the number one choice for universities and R&D labs around the world. Our advanced products are trusted for their consistency, purity, and high production standards. This, combined with our low prices and superior customer service make us the only resource you need for graphene and other nanomaterials.
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1. Preparation Method
CVD Method
2. Characterizations
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Substrate: |
SiO2/Sapphire |
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Size: |
9 mm*9 mm |
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Thickness： |
0.6-0.8 nm |
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Diameter range: |
20-50 μm |
Typical Microscope Image (1) of ACS Material Monolayer MoS2 on SiO2 (20-50μm)
Typical SEM Image (1) of ACS Material Monolayer MoS2 on SiO2 (20-50μm)
Typical AFM of ACS Material Monolayer MoS2 on SiO2 (20-50μm)
Typical Optical Spectrum of ACS Material Monolayer MoS2 on SiO2 (20-50μm)
3. Application Fields
An excellent device materials for studying the number of layers and fluorescence effects.
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